-SiN _ Ternary oxide
- Patterning (Spacer for SADP/QP)
- Gap fill
Introduction.Deposition process in forming multiple patterning films such as SADP and SAQP plays a key role as it defines critical dimensions.GEMINI ALD SYSTEM provides solution for multi-patterning applications with high-quality conformal and very uniform films.
With its small foot print it outperforms many of its competitor models with high UPEH and extreme uniformity control.It also provides various knobs for map profile control and easy process temperature changes without hardware modifications.
Technology.High etch selectivity, smooth film surface, adjustable film stress are controled by composition rate .
1. Carefully designed chamber, swappable process kits and pumping system for minimal defect and easy maintenance.
2. Edge and backside control by edge flow and vacuum chucking system: Less edge defect and more DOF margin.