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Precursor Supply System

气体供给装置 (Precursor Supply System) 镀膜时以一定的流量和压力,稳定的供应半导体CVD工序上所需前驱体(Precursor)的设备 本设备装有Bulk/Process Canister,无需中断工序,可以持续供给 可定制设计,用于特定使用目的和领域。 可使用的前驱体(Precursor):TEOS, TICL4, TEB, TEPO, LTO-520, TMB, HCDS, C6H12, 4MS, TBAS, DEZ, LTO-770 & TDMAS

Precursor Supply System is a device to safely supply precursor required for semiconductor CVD process for thin film deposition with constant flow rate and pressure. 


This unit is designed to supply the precursor without process interruption by installing bulk / process canister.


Product Features

Applicable Precursor: TEOS, TICL4, TEB, TEPO, LTO-520, TMB, HCDS, C6H12, 4MS, TBAS, DEZ, LTO-770 & TDMAS

PLC and touch screen based automation system